nano-lithography

– this include a wide range of technology writer should concentrate on electron beam lithography
– the course work should have as minimum 10 references and between (2010-2016)
– zero plagiarism- the information should be taken form the resources approximatelly equally presentage
-the introduction should be no more than 10 percent and the conclusion as well.
-Good English.
-journal style, sound physics, written scientifically educated,p(2s)

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